Oxford instruments plasmalab system 100 icprie the oxford inductivelycoupled plasma reactive ion etch system is currently configured to etch a wide range of materials with anisotropic features. Gce has extensive experience with sales, refurbishment, and support of oxford instrument models. Oxford instruments, plasmalab 80 plus capabilityapplication the plasmalab 80 plus is a plasma processing system which is configured to carry out reactive ion etching. Oxford plasmalab 100icp silicon based dielectric etching oxide, nitride, low stress nitride quartz and fused silica etching no borofloat, pyrex, etc recent upgrade to 12 line gas pod and installation of gas ring in close proximity to the substrate. This tool is intended for a relatively wide range of. Plasmalab system100 system diagrams works order no 94220025 original instructions customer. The pdf edition of this manual contains hyperlinks coloured blue, including the. The plasmapro 100 cobra icp utilises highdensity plasma to achieve fast etching and deposition rates. Oxford instruments plc 3 half year results announcement for the six months ended 30 september 2015 3 outlook nanotechnology is positioned to continue to yield long term structural growth in demand for high technology tools. Process development is done using taguchi l9 method of design of experiments doe.
Pdf a comparison of production plasma etch chemistries for inp. Process tool software oxford instruments pc2000tm software is clear, easy to use, quick to learn and configured exactly for the customers system. Oxford instruments plc is a leading provider of high technology products, systems and tools to the worlds leading industrial companies and scientific research communities. The purpose of this document is to describe requirements and basic operating instructions for the oxford instruments system 100 icp 180 tool for rie. Its visual interface controls and monitors the process tool, and offers the ability to control a.
Oxford plasmalab 100 pecvd system classone equipment. Oxford instruments plasmalab 80 plus reactive ion etch system. Oxfordplasmalab 100icprie45031 bridge tronic global. Oxford plasmalab system 100 multipurpose plasma etcher. Itcan be configured to carry out reactive ion etching rie, plasma enhanced chemical vapour deposition pecvd, inductivelycoupled plasma icp and electron cyclotron resonance ecr processes. Equipment oxford instruments plasmalab 80 plus cpi. A b rotary booster pumps ribbon cable 200 extraction collar gas pod clean room wall allow 400 mm clearance at rear plasmalab console 80 plus allow 900 mm clearance at front and sides 580 790 alternative position for gas pod length of cable from gas pod to unit is.
Plasmalab systems from oxford instruments go down under. Used oxford instruments plasmalab 800 plus rie for sale by. The cnms offers two oxford instruments plasmalab system 100 plasma dry etchers used to etch a wide variety of thin films and materials. Manufacturing technology that will change the world. Oxford plasmalab 100 icp etcher, refurbished for sale. This icp reactive ion etching system oxford instruments plasmalab 100 has an inductively coupled plasma source for highspeed, anisotropic plasma etching. Oxford instruments plasma technology oipt, based in yatton, bristol, uk, has received a threesystem order from the melbourne centre for nanofabrication mcn in australia. Plasma pro 100 is a platform used for processing up to 200mm wafers, through deposition or etching technologies, for a wide range of applications. Oxford plasmalab system 100 multipurpose plasma etcher users manual coral name. Oxford plasma technology etch and deposition products. The purpose of this document is to describe requirements and basic operating.
Plasmapro 100 cobra icp etching system oxford instruments. The sample susceptor is 10 inches in diameter that can hold 6 or 8 inch wafer. Oxford instruments plasmalab system100 icp rie the oxford instruments inductively coupled plasma reactive ion etch system is used exclusively for the etching iiiv compound semiconductors. Optimization of plasma enhanced chemical vapor deposition. Supported by oxford instruments preventative maintenance and service contract packages, the ultimate in system uptime can be assured. Gas pods supplied by oxford instruments plasma technology incorporate a 100 mm. Oxford instruments plasmalab 80 plus pecvd and icpdrie. The hardware interlocks, and their effect on the system components in the case ofan interlock. Oxford instruments plasmapro 100 process modules offer a 200mm platform with single wafer and multi.
The process modules offer excellent uniformity, high throughput and high precision processes. Oxford instruments plasma technology is a leading provider of high technology tools and systems for industry and research across the world. Please contact us for the availability of the oxford instruments plasmalab system 100 used semiconductor equipment. Oxford instruments plasmalab system100 freon icp rie micro. Triton xlq is our newest and now largest cryofree dilution refrigerator, designed for scaleup quantum computing. Installation data oxford instruments plasma technology plasmalab80plus rie 600. Low fc ratio gas chemistries c4f8, c2f6, c4f6, ch2f2, chf3. You are welcome to inspect prior to making a purchase commitment. Oxford instruments is committed to providing a comprehensive, flexible and reliable global customer support. It uses chlorine and brominebased chemistries to etch a wide variety of materials including metals e. One system is primarily used to etch siliconbased films and materials, the other is primarily used to etch metals and most other less common materials that can be chemically andor physically etched. Oxford plasmalab system 100 multipurpose plasma etcher users. We remain focused on our strategy to be the worlds leading nanotechnology tools provider. Oxford instruments plasmalab 80 plus pecvd and icpdrie the device has two vacuum chambers in which other one is the pecvd reactor.
The tool is loadlocked and is currently configured to handle 4inch wafers. Introduction this report documents the process development of amorphous silicon asi thin films deposited by plasma enhanced chemical vapor deposition pecvd using oxford plasmalab 100 system. Plasmapro 100 pecvd process modules are specifically designed to produce excellent uniformity and high rate films, with highcontrol of film properties. Plasma enhanced chemical vapor deposition pecvd of. Oxford instruments, plasmalab 100 using 25 w sample rf power, 10 mtorr pressure and 10 sccm gas flow.
Innovation plasmapro 100 oxford instruments careers. The systems, two plasmalab system100 icp380 tools and a plasmalab system100 pecvd, have been bought as part of mcns programme to equip its cleanrooms with instrumentation for. Plasmalab system 100 oxford instruments plasma technology system manual 3. The purpose of this document is to describe requirements and basic operating instructions for the oxford instruments system 100icp 180 tool for rie. Oxford instruments plasmalab system100 freon icp rie. Oxford instruments plasma technology issue 01 november 2010. This will replace two existing product lines, the plasmalab 100 and plasmapro100, offering customers a more flexible system in a more compact platform. At this time, nitrides such as gan are not allowed into the chamber.
The machine is controlled by a pc that runs the plasmalab 800 software. Cleaning and recalibration of mfcs inplace wet cleaning. Basic pecvd plasma processes sih 4 based pecvd sinx. The process recipes include etching siox, si3n4 and polysilicon. This etch was performed at 3 mtorr pressure, 50 w sample. Equipment manual contents university of california, berkeley. The tool is equipped with a temperature controlled electrode to help users tailor their etch feature profiles. A key application for this product line is in the production. Oxford instruments plasmalab 80 plus reactive ion etch rie system, refurbished system, morgan hill, ca usa, rf generator dressler hilight 3 300 watt. Oxford instruments plasmalab 80 plus reactive ion etch rie.
Its an icp based etcher designed to etch pieces mounted to a 100 mm wafer. Oxford instruments leading provider of plasma technology. Buy with confidence from the company that stands behind what they sell. The plasmapro 100 rie modules deliver anisotropic dry etching for an extensive range of processes. Four icp etchers from oxford instruments plasmalab system. The oxford instruments 3000 series xray tube has been developed for high flux stability and long life, making it ideal for continuous operation. All international shipping import duties and taxes are the responsibility of the purchaser. It was a major revision for oxford instruments plasma technology as it was their first system to use a plc with a windows based graphical user interface running a software called pcplus. Pecvd of silicon dioxide scholarlycommons university of. Introduction this report documents the study of deposition characteristics and film properties of silicon nitride sin x thin films deposited by plasma enhanced chemical vapor deposition pecvd using oxford plasmalab 100 system.
The diameter of the source only allows it to uniformly etch the center 1. A b rotary booster pumps ribbon cable 200 extraction collar gas pod clean room wall allow 400 mm clearance at rear plasmalab console 80 plus allow 900 mm clearance at front and sides 580 790 alternative position for gas pod length. Oxford plasmalab 300 rie reactive ion etch system semistar. Oxford instruments pc2000tm software is clear, easy to use, quick to learn and configured exactly for the customers system. Oxford instruments plasmalab system 100 icprie ralph n. The system controls the plasma chemistry within a process chamber and controls which materials are. At bridge tronic, we have an oxford plasmalab 100 icprie available for sale. Oxford instruments plasmalab 100 pecvd for sale in. The oxford system has an optical emission endpoint detector. Oxford instruments plasmalab system100 icp rie micro and. The system used for dry etching was a plasmalab system 100 icp etcher from oxford instruments plasma. Oxford icprie system 100 standard operating procedure. We offer excellent quality service throughout the life of your system. Classone equipment charges sales tax for items shipped to ca, ga, mi, tx, and mt.
Introduction this report documents the study of deposition characteristics and film properties of silicon dioxide sio 2 thin films deposited by plasma enhanced chemical vapor deposition pecvd using oxford plasmalab 100 system. Our core purpose is to support our customers to address some of the worlds most pressing challenges, enabling a greener economy, increased connectivity, improved health and. In addition to this oxford instruments plasmalab 80 plus, capovani brothers inc stocks a wide range of used and refurbished plasma etching equipment including rie, icp and drie plasma etch tools. Plasma enhanced chemical vapor deposition pecvd of silicon. The oxford plasmalab 100 inductively coupled plasma icp etcher is a multipurpose fluorocarbon based system that provides users anisotropic etching of silicon, silicon oxide, and other dielectric materials. Please contact us for more details and price quote. Oxford instruments plasmapro 100 process modules offer a 200mm platform with single wafer and multiwafer batch capability. The oxford instruments plasmalab system 100 plasma enhanced chemical vapor deposition pecvd tool is used to deposit a variety of thinfilm materials at relatively modest temperatures on a variety of substrate materials. Pecvd is a chemical thin films deposition method in which suitable mixture of process gases are added to the processing chamber and then ionized to plasma by electromagnetic rffield. Nh3 100%100 sccmmks 1479a n2o 100%3 slmmks 1179a n2o 100%200 sccm mks 1179a n2 100%2 slm mks 1179a o2 100%500 sccm mks 1179a refurbishment to include but not limited to the following. Oxford plasmalab 300 rie reactive ion etch system, refurbished system, morgan hill, ca usa,valid time.
Oxford instruments plasmalab 100 sf6, o2, chf3, and bosh process using c4f8 trion phantom iii rie sf6, o2, chf3, cf4, and ar technics peiia plasma asher thinfilm characterization zygo newview 6000 noncontact profilometer dektak 150 stylus profilometer rudolph instruments 439 ellipsometer miscellaneous. Icpplasmapro 80 icpplasmapro 100 cobraplasmapro 100 polarisrie plasmapro 80 rieplasmapro 100 rieplasmapro 800 rie. It is used to deposit lowstress thin films with excellent step coverage on a variety of samples at low temperatures generally 200 300 o c. Oxford instruments plasma technology university of notre dame. This oxford plasmalab system 100 is a plasma enhanced chemical vapor deposition pecvd system. In all areas, the hardware interlockwill override any software interlock. Plasma enhanced chemical vapor deposition pecvd irdq. System manual oxford instruments plasma technology plasmalab system 100 3. Oxford plasmalab 100 page 1 of 4 general process and operation specification oxford system 100 icp 180 i. Nanofabrication facility charles black, facility leader. The oxford plasmalab system 100 is a 100 mm reactive ion etching tool designed for a variety of etches.
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